产品系列

IMTEC  IPA  Dryer

IMTEC IPA Dryer

IMTEC IPA Dryer利用去离子水和异丙醇(IPA)蒸气的表面张力之间的差异,产生快速和有效的干燥效果。

Accudry已经被设计为易于使用,操作IPA蒸汽干燥机是简单的加载,设置,运行。


  • Surface tension ipa vapor drying yields substrates that are spotless and watermark-free.

  • The Accudry has been designed for ease-of-use, operating the IPA vapor dryer is as simple as load, set, run.

  • With no moving parts and no mechanical stresses, the elimination of spin drying dramatically reduces wafer breakage as seen in spin rinser dryers.

When integrated with cleaning and rinsing, this patented tool can provide an environmentally friendly process for drying wafers, silicon, ICs, solar cells, fuel cells, MEMS, disk drives, and much more. The vapor dryer can process a variety of substrate types and sizes in numerous batch configurations. The Accudry can be produced as a stand alone unit or integrated into a wet processing station.


Designed With Safety in Mind- Key safety interlocks, reliable and robust electronic components, IPA maintained at room temperature, emergency shut offs, intrinsically safe switches, critical components UL listed.

Flexible, Intuitive, Recipe Driven Software- MFC's and all flows are under complete software control allowing for fully customized processes and run times. A 100 recipe capacity enables the flexibility to run many different substrates and materials in the same dryer.

Tank & Lid- Designed to customer specifications for optimized drying of any substrate material, size, and shape.

Patented Technology- System uses only 10ml of IPA per batch, no disposal required, unmatched cleanliness, no heated IPA, elimination of substrate touch points.

Maintainability- Access to subsystems front and back, quick access to electrical cabinet, separation of key subsystems, software includes maintenance menu and functions.


Accudry Key System Components:

Dryer Cabinet- White PVCC Plastic shell (FM4910 Compliant), EPO safety shutdown, Foot switch for tank lid open/close.

Rinse/Dry Tank- PVDF rinse/dry tank with special fixturing to reduce contact areas on wafers. Includes N2 / IPA Dispersion manifold in automated lid. High and low flow drain valves are incorporated for precise draining.

PLC Control System- Graphical touchscreen interface allows for ease of use and continuous feedback of all major functions as well as a digital I/O interface for all functional components.

IPA/N2 Manifolds- Mass Flow Controllers are used for N2 and IPA flows allowing for different flow rates to be programmed into recipes

Stainless Steel IPA Canister- Electropolished Stainless IPA canister uses low pressure N2 to vaporize IPA

Available Chamber Sizes

Single/Dual 150mm Cassette

Single/Dual 200mm Cassette

Single/Dual 300mm Cassette

Custom Sizes Available


OEM IPA Vapor Dryer

Model: ADO-XXXX

The ADO model is designed for custom integration in to any OEM wet station.

Accudry Facilities Requirements:


Clean Room EnvironmentISO Certified Class 10 or better
Electrical200-240VAC Single Phase, 50-60Hz, 30 amps
DI H2O30 GPM @ 40PSI
IPA SupplySemiconductor Grade Required
Process N250-600 Lpm @ 80 PSI
Exhaust100SCFM @ .5” H2O, 4.0” duct
IPA subsystem exhaust20SCFM @ 1” static pressure, 2” duct
Plenum Drain10GPM, 2.0” sch 80 PVC
System CDA70PSI